Resonator for thermo optic device

ABSTRACT

A resonator for thermo optic devices is formed in the same process steps as a waveguide and is formed in a depression of a lower cladding while the waveguide is formed on a surface of the lower cladding. Since upper surfaces of the resonator and waveguide are substantially coplanar, the aspect ratio, as between the waveguide and resonator in an area where the waveguide and resonator front one another, decreases thereby increasing the bandwidth of the resonator. The depression is formed by photomasking and etching the lower cladding before forming the resonator and waveguide. Pluralities of resonators are also taught that are formed in a plurality of depressions of the lower cladding. To decrease resonator bandwidth, waveguide(s) are formed in the depression(s) of the lower cladding while the resonator is formed on the surface. Thermo optic devices formed with these resonators are also taught.

RELATED APPLICATIONS

This application is a Divisional of U.S. application Ser. No.11/493,717, filed Jul. 26, 2006, which is a Continuation of U.S.application Ser. No. 10/231,897, filed Aug. 29, 2002, now issued as U.S.Pat. No. 7,120,336, which are incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to thermo optic devices, such as opticalwaveguides. In particular, it relates to a resonator for frequencycoupling between input and output waveguides of a thermo optic device.Even more particularly, it relates to an efficiently formed resonatorhaving increased bandwidth.

BACKGROUND

The art of making and developing new uses for thermo optic devicescontinues to emerge. Presently, thermo optic devices are used asfilters, switches, multiplexers, waveguides, and a host of othersemiconductor and optical transmission devices.

With reference to FIGS. 1A and 1B, a prior art thermo optic device inthe form of an optical waveguide is shown generally as 110. It comprisesa grating 112 formed of a lower cladding 114, an upper cladding 116, aninput waveguide 118, an output waveguide 120 and a resonator 122. As isknown, the waveguides and resonator are formed of a material having ahigher or lower refractive index than that of the upper and lowercladdings to propagate light in the resonator and waveguides during use.The grating 112 is disposed on a substrate 124. In many thermo opticdevices the substrate is a printed circuit board or some form ofsilicon.

In forming the device, the lower cladding is deposited on the substrate.An intermediate layer, for the waveguides and resonator, is deposited onthe lower cladding, photo patterned and etched. The upper cladding isdeposited on the waveguides and resonator. In an alternate formationprocess, the lower cladding 206 is an oxidation of a silicon substratewith the waveguides, resonator and upper cladding being formed in thesame manner.

The inherent characteristics of a resonator, such as its size, shape,composition, etc., may vary greatly from resonator to resonator as afunction of the particular application in which the thermo optic deviceis to be used. The characteristics of all resonators, however, aregenerally selected in such a manner to eliminate crosstalk between theinput and output waveguides at undesirable frequencies and to resonatesignals (i.e., prolong and/or intensify) at desirable frequencies. Thesedesirable frequencies are typically defined in a bandwidth of somelength about a center frequency.

In the representative prior art embodiment shown in FIG. 1B, theresonator 122 has a generally symmetrical tooth-shaped pattern. To setthe center frequency, the pitch between teeth is adjusted.

To set the bandwidth, an aspect ratio is adjusted in an area where thewaveguide and resonator front or face one another. For example, in FIG.1A, resonator 122 has a surface 123 facing a surface 119 of inputwaveguide 118. The aspect ratio (a.r.) in this area is defined as thearea of the input waveguide surface to the area of the resonator surface(a.r.=area of input waveguide surface/area of resonator surface). Alarge bandwidth corresponds to a small aspect ratio while a smallbandwidth corresponds to a large aspect ratio. Correspondingly, a largebandwidth can be achieved by either increasing the area of the resonatorsurface, decreasing the area of the input waveguide surface, oradjusting both surface areas in such a manner to achieve a relativelysmall ratio number. A small bandwidth can be achieved by eitherdecreasing the area of the resonator surface, increasing the area of theinput waveguide surface, or adjusting both surface areas in such amanner to achieve a relatively large ratio number. Even further,increases or decreases of surface area can be achieved by adjusting oneor both of the surface dimensions of the waveguide or resonatorsurfaces. For example, depth “D” of surface 119 or 123 may be increasedor decreased according to desired bandwidth.

Since the resonator 122 and the input and output waveguides 118, 120 areformed together during the same process steps as described above, thedepth, D, of the resonator is essentially fixed as the same depth of thewaveguides and therefore the resonator bandwidth is fixed. Moreover,changes in depth that result in increased resonator bandwidth are nottrivially accomplished and often result in complicated manufacturingprocesses and excessive resource and financial expenditures.

Accordingly, the thermo optic arts desire resonators having increasedbandwidths that are relatively cheap and quick to produce withoutsacrifices in any resonator quality, reliability or longevity.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a cross sectional view of a thermo optic device in the formof an optical waveguide in accordance with the prior art;

FIG. 1B is a planar view of the thermo optic device of FIG. 1A;

FIG. 2A is a cross sectional view of a lower cladding in which aresonator in accordance with the teachings of the present invention willbe formed;

FIG. 2B is a cross sectional view in accordance with the teachings ofthe present invention of a first photomasking step in a processing stepsubsequent to FIG. 2A;

FIG. 2C is a cross sectional view in accordance with the teachings ofthe present invention of a depression formed in a lower cladding in aprocessing step subsequent to FIG. 2B;

FIG. 2D is a cross sectional view in accordance with the teachings ofthe present invention of a layer deposited on the lower cladding in aprocessing step subsequent to FIG. 2C;

FIG. 2E is a cross sectional view in accordance with the teachings ofthe present invention of a second photomasking step in a processing stepsubsequent to FIG. 2D;

FIG. 2F is a cross sectional view in accordance with the teachings ofthe present invention of a patterned resonator and waveguides in aprocessing step subsequent to FIG. 2E;

FIG. 2G is a cross sectional view in accordance with the teachings ofthe present invention of a resonator and waveguides covered by an uppercladding thereby forming a thermo optic device in a processing stepsubsequent to FIG. 2F;

FIG. 3A is a cross sectional view in accordance with the teachings ofthe present invention of another embodiment of a depression in a lowercladding;

FIG. 3B is a cross sectional view in accordance with the teachings ofthe present invention of still another embodiment of a depression in alower cladding;

FIG. 4A is a cross sectional view in accordance with the teachings ofthe present invention of an input waveguide formed in a depression of alower cladding;

FIG. 4B is a cross sectional view in accordance with the teachings ofthe present invention of an input and output waveguide formed indepressions of a lower cladding;

FIG. 5 is a cross sectional view in accordance with the teachings of thepresent invention of a plurality of resonators formed in a plurality ofdepressions of a lower cladding;

FIG. 6 is a perspective view in accordance with the teachings of thepresent invention of a depression formed across a lower cladding;

FIG. 7 is a perspective view of an alternative embodiment of a pluralityof depressions formed in a lower cladding;

FIG. 8 is a perspective view in accordance with the teachings of thepresent invention of a depression pattern formed in a lower cladding;

FIG. 9 is a perspective view in accordance with the teachings of thepresent invention of a plurality of regions of the lower cladding havingdepressions formed therein;

FIG. 10 is a cross sectional view in accordance with the teachings ofthe present invention of a waveguide and a resonator formed in aplurality of depressions of the lower cladding;

FIG. 11 is a block diagram of a system having a thermo optic packagecomprising resonators formed in accordance with the teachings of thepresent invention; and

FIG. 12 is an alternative embodiment of a thermo optic packagecomprising resonators formed in accordance with the teachings of thepresent invention.

DETAILED DESCRIPTION

In the following detailed description of the preferred embodiments,reference is made to the accompanying drawings which form a part hereof,and in which is shown by way of illustration, specific embodiments inwhich the inventions may be practiced. These embodiments are describedin sufficient detail to enable those skilled in the art to practice theinvention, and it is to be understood that other embodiments may beutilized and that process, electrical or mechanical changes may be madewithout departing from the scope of the present invention. The termsubstrate used in this specification includes any base semiconductorstructure such as silicon-on-sapphire (SOS) technology,silicon-on-insulator (SOI) technology, thin film transistor (TFT)technology, doped and undoped semiconductors, epitaxial layers of asilicon supported by a base semiconductor structure, as well as othersemiconductor structures well known to one skilled in the art. Thefollowing detailed description is, therefore, not to be taken in alimiting sense, and the scope of the present invention is defined onlyby the appended claims and their equivalents.

The following description and figures use a reference numeral conventionwhere the first digit of the reference numeral corresponds to the figureand the following two digits correspond to like elements throughout thespecification. For example, the lower cladding of a thermo optic deviceof the present invention has a reference number of 202, 302, 402, etc.corresponding to the lower cladding X02 in FIGS. 2, 3, 4, etc. where Xis the number of the figure in which the reference numeral appears.

With reference to FIG. 2A, a substrate 200 is provided upon which aresonator for use with a thermo optic device will be formed. In oneembodiment the substrate is silicon. In another embodiment, it is aprinted circuit board. In still another, it is any surface upon which alayer may be deposited.

A first layer 202 or lower cladding is formed on the substrate. In oneembodiment, the substrate is some form of silicon and the first layer isformed as a grown layer via oxidation of the substrate. In anotherembodiment, the first layer is formed by deposition techniques.

Some particular deposition techniques for the first layer, and allremaining deposited layers, include, but are not limited to, any varietyof chemical vapor depositions (CVD), physical vapor depositions (PVD),epitaxy, evaporation, sputtering or other known or hereinafter developedtechniques. Specific CVD techniques include low pressure (LP) ones, butcould also be atmospheric pressure (AP), plasma enhanced (PE), highdensity plasma (HDP) or other.

In one particular embodiment, the first layer is a silicon oxide that isdeposited via a LPCVD technique using a tetraethyl orthosilicate or TEOSsource.

After depositing the first layer, a first mask 204 is provided to photoimpact 206 the first layer 202 in a photomasking step so that a photoimpacted region 208 is formed in the lower cladding.

In one embodiment, the photo impacting is accomplished with anultraviolet light from a photolithography device well known to thoseskilled in the art. The photo impacting, however, should not be limitedto such an embodiment and may alternatively include X-rays or otherlight sources.

The first mask 204 may be configured as a clear-field or dark-fieldmask, as those terms as well understood by skilled artisans, accordingto the desired design of the photo impacted region 208 in the lowercladding.

Thereafter, with reference to FIG. 2C, the first layer 202 is etched sothat the photo impacted region 208 is removed thereby leaving or forminga depression 210 in the lower cladding. In the embodiment shown, thedepression 210 is shaped as a trench but it may also comprise othershapes, such as a concavity 310A (FIG. 3A), an angular indentation 310B(FIG. 3 b) or other.

It should be appreciated that while the depression 210 is depicted in across sectional view it also has a lengthwise dimension (into or awayfrom the paper) and it may be formed completely across the surface ofthe lower cladding or may be formed in just a particular region thereof.For example, with reference to FIG. 6, the depression is formed as atrench 610 across an entire surface 621 of lower cladding 602. In FIG.7, the depression is formed as a plurality of concavities 710 in onlyvarious regions of surface 721 of lower cladding 702.

In still another embodiment, the depression may take on a desiredpattern or shape across the lower cladding or in just a particularregion. For example, in FIG. 8, the depression is formed as a trench 810extending lengthwise across surface 821 of the lower cladding 802. Thetrench 810 has a bend 811 representative of at least one depressionpattern. In FIG. 9, the depression of the lower cladding 902 isrepresented as a plurality of concavities 910 having a generally cubeshape that is formed in various specific or random regions of surface921.

Those skilled in the art will appreciate that even further forms, shapesand dimensions of depressions are formable in the lower cladding andinclude, but are not limited to rectangles, circles, serpentineformations, tooth-shaped patterns, polygons, triangles, squares, or anyother geometric shape(s) that could be fabricated with the first mask.It should be further appreciated that the particularly shown trenches,concavities, and angular indentations may be of various dimensions andtake on any or all embodiments shown herein.

With reference to FIGS. 2B and 2C, some etching techniques embraced bythis invention for removing the photo impacted region 208 from the lowercladding 202 to form depression 210 include, but are not limited to, anyvariety of wet etches including immersion or spray, or dry etchesincluding plasma, barrel or planar, ion milling, reactive ion etches(RIE) or deep RIE.

In one particular embodiment of the invention, the photo impacted region208 is dry etched with a photo resist pattern and CF₄ or CF₄CHF₃ Argonbased chemistry in a parallel plate reactor for 360 seconds under theconditions of about 50 militorr, 600 watts and 13.56 MHz.

With reference to FIG. 2D, a second layer 212 is formed on the surfaceof the first layer 202 in such a manner to “fill” the depression 210 andcover the lower cladding as shown.

In one embodiment, the second layer is a silicon oxynitride depositedwith a PECVD technique using a silane with nitrous oxide reaction in anargon or helium plasma for 180 seconds, under the conditions of 400° C.,450 watts and 13.56 MHz. In another embodiment, the second layer is atranslucent material.

While the lower cladding, in one embodiment, was formed of a siliconoxide and the second layer was formed of silicon oxynitride, it shouldbe appreciated that numerous other materials for these first and secondlayers exist. What dictates the selection of the materials is the indexof refraction. This is because the second layer will be formed into thewaveguide and resonator and light will be propagated therein viareflections of light that occur at the boundary where the two layersmeet. So long as the second layer is a material having an index ofrefraction that is different, either higher or lower, than the index ofrefraction for the first layer (at whatever wavelength of light thethermo optic device is designed for) light signals can be propagated.

With reference to FIG. 2E, after depositing the second layer 212, asecond mask 214 is provided to photo impact 216 the second layer 212 inanother photomasking step.

As with the first photomasking step, the photo impacting is accomplishedwith an ultraviolet light from a photolithography device but mayalternatively include X-rays or other light sources. The second mask beconfigured in such a way that the photo impacted region of the secondlayer takes on a desired form such as those previously shown. Someparticular mask embodiments include, but are not limited to, clear-fieldor dark-field masks.

As shown in FIG. 2F, the photo impacted region 209 of the second layer212 caused by photo impacting 216 is etched away thereby forming aresonator 222 and at least one waveguide. In this embodiment, thewaveguide is an optical waveguide having an input waveguide 218 and anoutput waveguide 220 on either sides of the resonator.

Many things should now be apparent to those skilled in the art. Forexample, the resonator 222 has a portion thereof, having a depth “D,”formed in the depression between surface 221 of first layer 202 anddepression bottom 223. It has another portion thereof formed betweensurface 221 and plane 225. Simultaneously, the waveguides 218, 220 haveno portion thereof formed in the depression and all portions thereofformed on the surface 221 of the first layer and extending from thesurface 221 to plane 225. As a result, the aspect ratio between theresonator and the waveguides has decreased (in comparison to the priorart, FIG. 1A, for example) thereby increasing resonator bandwidth.

In particular, the aspect ratio (a.r.) in area 231 has decreased wherethe input waveguide 218 and resonator 222 front one another alongresonator surface 223 and input waveguide surface 219, wherein (a.r.) inarea 231 is defined as the area of the input waveguide surface 219 tothe area of the resonator surface 223 or (a.r.=area of input waveguidesurface 219/area of resonator surface 223). (As will become apparentfrom the following discussion, the aspect ratio between adjacentresonators (FIG. 5, 522A and 522B) also decreases which also helps witheasier processing for the top cladding layer.)

In area 233, the aspect ratio has similarly decreased where the outputwaveguide 220 and resonator 222 front one another along resonatorsurface 225 and output waveguide surface 221, wherein (a.r.) in area 233is defined as the area of the output waveguide surface 221 to the areaof the resonator surface 225 or (a.r.=area of output waveguide surface221/area of resonator surface 225).

In one particular embodiment of the invention, it has been discoveredthat the aspect ratio decreased so significantly that the resonatorbandwidth approximately doubled by increasing from about 16 nm to about32 nm.

The depth “D” to which the resonator is formed in or fills thedepression is dictated by at least two factors. The first is a practicallimitation governed by the fill capability inherent in the material ofthe second layer. For example, if the second layer were deposited as aliquid (amorphous), and the depth of the depression was a relativelysubstantial percentage of the thickness of the lower cladding, it wouldlikely fill to a greater depth than a non-liquid. Second, the depth is afunction of the frequency gain the designed resonator is trying toachieve and varies greatly from application to application.

The height of the resonator between surface 221 and plane 225 is notrequired to be any particular height and is dictated according to thefrequency characteristics demanded by the particular application inwhich the resonator is used. As a reference point, however, resonatorand waveguide height is often in a range from about 1 to about 2microns.

Similarly, the horizontal spacing between the resonators and thewaveguides is not required to be any particular distance and is dictatedaccording to the frequency characteristics demanded by the particularapplication in which the resonator is used. As a reference point,however, horizontal spacing between resonators and waveguides is oftenin a range from about 1 to about 2 microns.

It should also be appreciated that the upper surfaces of the input andoutput waveguides 218, 220 and resonator 222 are all substantiallycoplanar as defined by plane 225 (although only shown in one dimension).As a result, the manufacturing of a resonator having an increasedbandwidth is completed after the etching process performed on the secondlayer and no additional processing steps need to occur.

To complete the thermo optic device, however, a third layer 224 or uppercladding is deposited on the waveguides 218, 220, the resonator 222 andportions 235 of the lower cladding not having a waveguide or resonator.The upper cladding is deposited to a thickness sufficient to preventoutside light from interfering with the light propagated in thewaveguide during use. As a reference point, however, thickness for boththe upper and lower claddings is often the same and in one embodiment isabout 4 microns nominally.

In one embodiment, the third layer is a second silicon oxide layerdeposited in the same manner as previously described for the firstlayer. In another embodiment, the third layer has an index of refractionthat is substantially equal to the index of refraction of the firstlayer.

It will be appreciated that the third layer 224 has an upper surface 226that can be used to stack multiple thermo optic devices by continuingthe deposition, patterning and etching processes described herein. Thesurface 226 may alternatively contain a heater (not shown) for changinga thermo optical property of the device as light propagates in thewaveguide during use.

With reference to FIG. 5, it will be appreciated that thermo opticdevices of the present invention may be formed with a more than a singleresonator. For example, a plurality of resonators, first and secondresonators 522A and 522B, are formed in a corresponding number ofdepressions, first and second depressions 510A and 510B, while first andsecond waveguides, input and output waveguides 518, 520 are formed onthe surface 521 of the lower cladding. In one embodiment, the horizontalspacing between adjacent resonators is in a range from about 2 to about3 microns while the horizontal width of the resonator is about 2 micronsnominally. In this manner, even further variations in the frequencycharacteristics of the resonator can be achieved as application demandvaries.

Those skilled in the art will appreciate that still other numbers ofresonators could be formed in the depressions while forming waveguideson the surface of the lower cladding.

While the foregoing teaches resonators having increased bandwidth, in analternate embodiment of the present invention, it may be desirable todecrease resonator bandwidth by increasing the previously describedaspect ratio(s).

For example, with reference to FIG. 4A, a first waveguide, inputwaveguide 418A is formed in a depression 410 while resonator 422 isformed on the surface 421 of the lower cladding 402. In FIG. 4B, a firstand second waveguide, input and output waveguides 418B, 420B are formedin depressions 410 while the resonator 422 is formed on surface 421 ofthe lower cladding 402.

In still another embodiment, it may be desirable to increase someresonator bandwidths while decreasing others. With reference to FIG. 10,waveguide 1018 is formed in a first depression 1010A while a firstresonator, resonator 1022A, is formed on the surface 1021 of the lowercladding 1002. Accordingly, the aspect ratio in area 1031 is increasedas between waveguide 1018 and resonator 1022A, thereby decreasingbandwidth of resonator 1022A. Waveguide 1020, on the other hand, isformed on the surface 1021 while a second resonator, resonator 1022B, isformed in depression 1010B of the lower cladding. Accordingly, theaspect ratio in area 1033 is decreased as between waveguide 1022 andresonator 1022B, thereby increasing bandwidth of resonator 1022B.

It will be appreciated that during use, the resonators of the presentinvention may be used with thermo optic devices in a variety ofapplications. For example, the thermo optic device may be an amplifier,modulator, gate, filter, time delay element, switch, multiplexer, orother.

With reference to FIG. 11, a system, having as part thereof a resonatoror waveguide formed in accordance with the teachings of the presentinvention, is shown generally as 1141. The system may be an exclusivelyfiber optic system or may be a system having other software and hardwaredevices, as indicated by the dashed line 1145, operably coupled to atleast one fiber optic component thereof.

In either system, a light source 1143 will be provided as the source forpropagating light signals along at least one fiber optic line 1147. Wellknown light sources include, but are not limited to, laser lightsources. In the embodiment shown, the system 1141 includes a pluralityof fiber optic lines 1147.

Coupleable to the fiber optic lines via a plurality of input fiber opticports 1151 is a thermo optic package 1149. Contained within the thermooptic package is at least one thermo optic device 1153 having at leastone resonator or waveguide formed in accordance with the presentinvention. In the embodiment shown, the thermo optic device 1153 iscoupled to the input fiber optic port 1151 via an input connector 1155while an output connector 1157 couples the thermo optic device to anoutput fiber optic port 1159. In turn, the output fiber optic port 1159is coupled to another fiber optic line 1147 of system 1141.

During use, a system user merely needs to couple fiber optic lines 1147to the input and output fiber optic ports of the package 1149 to readilyachieve at least one resonator or waveguide having an increased ordecreased bandwidth as necessary.

With reference to FIG. 12, an alternative embodiment of a thermo opticpackage 1249 is shown having a thermo optic device 1253 with a singleinput connector 1255 and a plurality of output connectors 1257. Theinput connector 1255 connects with input fiber optic port 1251 which isreadily matable with a fiber optic line 1247 of a system. The outputconnectors 1257 of thermo optic device 1253 are each matable with anoutput fiber optic port 1259.

In another embodiment, the single input connector of the thermo opticdevice 1253, having a resonator or waveguide formed in accordance withthe present invention, may alternatively be replaced with two or moreinput connectors while the two output connectors may be replaced withone or more output connectors depending upon the type and desired use ofthe thermo optic device 1253.

The above structures and fabrication methods have been described, by wayof example, and not by way of limitation, with respect to resonators forthermo optic devices.

In particular, the resonator of a thermo optic device is formed in thesame process steps as a waveguide and is formed in a depression of alower cladding while the waveguide is formed on a surface of the lowercladding. In this manner, since an upper surface of the resonator andthe waveguide is substantially coplanar, the aspect ratio as between thewaveguide and resonator in an area where the waveguide and resonatorfront or face one another decreases thereby increasing the bandwidth ofthe resonator. The depression is formed by photomasking and etching thelower cladding before forming the resonator and waveguide. Somedepression embodiments include trenches, concavities and angularindentations.

In another embodiment, a plurality of resonators are taught that areformed in a plurality of depressions of the lower cladding while aplurality of waveguides are formed on the surface of the lower cladding.

In still another embodiment, waveguide(s) are formed in thedepression(s) of the lower cladding while the resonator is formed on thesurface. In this manner, the aspect ratio increases thereby decreasingbandwidth of the resonator.

Thermo optic devices formed with these resonators are also taught.

As a result, resonators of this invention can be formed quicker andcheaper without any corresponding sacrifice in quality, reliability orlongevity.

The present invention has been particularly shown and described withrespect to certain preferred embodiment(s). However, it will be readilyapparent to those of ordinary skill in the art that a wide variety ofalternate embodiments, adaptations or variations of the preferredembodiment(s), and/or equivalent embodiments may be made withoutdeparting from the intended scope of the present invention as set forthin the appended claims. Accordingly, the present invention is notlimited except as by the appended claims.

1. An apparatus, comprising: a first cladding including a depressiontherein; a waveguide in the depression and extending above a surface ofthe cladding; and a resonator extending up from the surface of thecladding adjacent to a portion of the waveguide extending above thesurface.
 2. The apparatus of claim 1, further including a substrate, thecladding being on the substrate.
 3. The apparatus of claim 1, furtherincluding a second resonator on the surface of the cladding.
 4. Theapparatus of claim 1, wherein the depression is a trench.
 5. Theapparatus of claim 1, wherein the depression is a concavity.
 6. Theapparatus of claim 1, wherein the depression is an angular indentation.7. The apparatus of claim 1, wherein the first cladding includes siliconoxide.
 8. The apparatus of claim 1, wherein the waveguide includessilicon oxynitride.
 9. The apparatus of claim 1, wherein the resonatoris formed of silicon oxynitride.
 10. The apparatus of claim 1, whereinthe waveguide and the resonator are substantially the same material. 11.The apparatus of claim 10, wherein the waveguide and the cladding areformed of materials including different indices of refraction.
 12. Theapparatus of claim 1, further including a second cladding on thewaveguide.
 13. The apparatus of claim 12, wherein the second claddingand the first cladding are substantially the same material.
 14. Theapparatus of claim 1, further including an input and output resonator onthe surface.
 15. The apparatus of claim 14, wherein the waveguide andthe input and output resonators have an upper surface that issubstantially coplanar.
 16. The apparatus of claim 1, wherein thewaveguide is a first waveguide in a first depression, and furthercomprising a second waveguide in a second depression in the firstcladding.
 17. The apparatus of claim 16, wherein the resonator is afirst resonator, and further comprising a second resonator extending upfrom the surface of the cladding.
 18. The apparatus of claim 17, whereinan upper surface of each of the first and second resonators and thefirst and second waveguides is substantially coplanar.
 19. The apparatusof claim 1, wherein the depression is a first depression, and furthercomprising a second depression in which a second resonator is disposed,the second resonator extending from in the depression to above thesurface.
 20. The apparatus of claim 19, further comprising a secondresonator extending up from the surface of the cladding.
 21. Theapparatus of claim 20, wherein an upper surface of each of the first andsecond resonators and the waveguides is substantially coplanar.
 22. Asystem including a fiber optic line, comprising: a package coupleablewith the fiber optic line; and a device in the package including a basecladding including a depression and a surface, a waveguide located inthe depression and extending from a bottom of a trench to a height abovethe surface and a resonator on the surface and extending from thesurface to the height.
 23. The system of claim 22, wherein the packagefurther includes at least one input fiber optic port and at least oneoutput fiber optic port.
 24. The system of claim 23, wherein the deviceincludes at least one input connector coupled to the at least one inputfiber optic port and at least one output connector coupled to the atleast one output fiber optic port.
 25. A package, comprising: a deviceincluding a base cladding including a depression and a surface, awaveguide located in the depression and extending from a bottom of thedepression to a height above the surface and a resonator on the surfaceand extending from the surface to the height above the surface.
 26. Thepackage according to claim 25, further including an input connector andan output connector coupled with the device.
 27. The package accordingto claim 26, further including an input fiber optic port coupled to theinput connector and an output fiber optic port coupled to the outputconnector.
 28. The package according to claim 26, wherein the inputconnector is a single input connector, and the output connector is oneof a plurality of output connectors.